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Journal of Bacteriology, April 2007, p. 3306-3311, Vol. 189, No. 8
0021-9193/07/$08.00+0     doi:10.1128/JB.00018-07
Copyright © 2007, American Society for Microbiology. All Rights Reserved.

Role of DNA Repair by Nonhomologous-End Joining in Bacillus subtilis Spore Resistance to Extreme Dryness, Mono- and Polychromatic UV, and Ionizing Radiation{triangledown}

Ralf Moeller,1,2 Erko Stackebrandt,2 Günther Reitz,1 Thomas Berger,1 Petra Rettberg,1 Aidan J. Doherty,3 Gerda Horneck,1 and Wayne L. Nicholson4*

German Aerospace Center, Institute of Aerospace Medicine, Radiation Biology Division, Research Group Photo- and Exobiology, Cologne, Germany,1 German Collection of Microorganisms and Cell Cultures GmbH, Braunschweig, Germany,2 Genome Damage and Stability Centre, University of Sussex, Brighton BN1 9RQ, United Kingdom,3 Department of Microbiology and Cell Science, University of Florida, Kennedy Space Center, Florida 328994

Received 4 January 2007/ Accepted 5 February 2007

The role of DNA repair by nonhomologous-end joining (NHEJ) in spore resistance to UV, ionizing radiation, and ultrahigh vacuum was studied in wild-type and DNA repair mutants (recA, splB, ykoU, ykoV, and ykoU ykoV mutants) of Bacillus subtilis. NHEJ-defective spores with mutations in ykoU, ykoV, and ykoU ykoV were significantly more sensitive to UV, ionizing radiation, and ultrahigh vacuum than wild-type spores, indicating that NHEJ provides an important pathway during spore germination for repair of DNA double-strand breaks.

* Corresponding author. Mailing address: Rm. 201-B, Space Life Sciences Laboratory, Building M6-1025/SLSL, Kennedy Space Center, FL 32953. Phone: (321) 861-3487. Fax: (321) 861-2925. E-mail: WLN{at}ufl.edu

{triangledown} Published ahead of print on 9 February 2007.

Journal of Bacteriology, April 2007, p. 3306-3311, Vol. 189, No. 8
0021-9193/07/$08.00+0     doi:10.1128/JB.00018-07
Copyright © 2007, American Society for Microbiology. All Rights Reserved.



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