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J. Bacteriol. doi:10.1128/JB.00018-07
Copyright (c) 2007, American Society for Microbiology and/or the Listed Authors/Institutions. All Rights Reserved.

Role of DNA repair by non-homologous end joining (NHEJ) in Bacillus subtilis spore resistance to extreme dryness, mono- and polychromatic UV and ionizing radiation

German Aerospace Center, Institute of Aerospace Medicine, Radiation Biology Division, Research Group Photo- and Exobiology, Cologne, Germany; German Collection of Microorganisms and Cell Cultures GmbH, Braunschweig, Germany; Genome Damage and Stability Centre, University of Sussex, Brighton BN1 9RQ, UK; Department of Microbiology and Cell Science, University of Florida, Kennedy Space Center, FL 32899 USA

^* To whom correspondence should be addressed. Email: WLN{at}ufl.edu.

	Abstract

The role of DNA repair by non-homologous end joining (NHEJ) in spore resistance to UV, ionizing radiation and ultrahigh vacuum was studied in wild-type and DNA repair mutants (recA, splB, ykoU, ykoV and ykoU ykoV) of Bacillus subtilis. NHEJ-defective spores with mutations in ykoU, ykoV, and ykoU ykoV were significantly more sensitive to UV, ionizing radiation and ultrahigh vacuum than wild-type spores, indicating that NHEJ provides an important pathway during spore germination for repair of DNA double-strand breaks.

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